FEI Quanta 3D FEG Dual Beam machine

Scanning electron microscope (SEM) combined with focused ion beam for materials characterization in 2 and 3D

Dual-Beam FIB-SEM Electron Microscope incl. EBSD

The FEI Quanta 3D FEG Dual Beam machine combines traditional thermal emission scanning electron microscopy (SEM) with focused ion beam (FIB). This combination allows the characterization of materials in 2 and 3D, TEM sample preparation, observations at the subsurface of the specimens and structural modification of sample surfaces at the micrometer to nanometer scale. The machine features three different vacuum modes, which accommodates the widest range of samples of any SEM system. It also has an EBSD detector for the crystallographic orientation analyses, and an EDS detector for semi-quantitative, punctual chemical analyses.

Fei Quanta 3D Dual-Beam Machine

Description

  • FEI Quanta 3D Dual-Beam® machine
  • Field emission gun electron source
  • Ga ion source
  • Magnification – 30x – 1.000.000x
  • SE, BSE and STEM detectors
  • EDAX-OIM electron backscatter diffraction (EBSD) system
  • Transmission Kikuchi Diffraction (TKD)
  • EDAX energy dispersive spectroscopy (EDS) system
  • Omniprobe nanomanipulator
  • In situ Pt and C gas injection systems
  • XeF2 injection needle for local etching
  • Low vacuum mode
  • Maximum electron beam resolution  - 0.8 nm at 30kV
  • Maximum ion beam resolution - 7 nm at 30kV
  • Deben 5kN microtest stage for in situ deformation experiments
  • Avizo Fire for 3D reconstruction in nanotomography